POLYMER AND PHOTORESIST COMPOSITION

PURPOSE: Provided are a polymer containing at least one of cyclic olefin monomers having fused cyclic electron taking groups as a polymerization unit, a method for preparing the polymer and a photo-resist composition containing the polymer as a resin binder to form relief images. CONSTITUTION: The p...

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Main Authors BARCLAY GEORGE G, ZAMPINI ANTHONY
Format Patent
LanguageEnglish
Korean
Published 26.09.2001
Edition7
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Abstract PURPOSE: Provided are a polymer containing at least one of cyclic olefin monomers having fused cyclic electron taking groups as a polymerization unit, a method for preparing the polymer and a photo-resist composition containing the polymer as a resin binder to form relief images. CONSTITUTION: The polymer comprises at least one of cyclic olefine monomers defined as the following formula(1) or (2) (wherein A is O, S, CR7R8 or NR5; R5 is phenyl, substituted phenyl, benzyl, substituted benzyl, (C1-C6) alkyl or substituted (C1-C6) alkyl; Z is O, S or NR6; R6 is (C1-C6) alkyl or substituted (C1-C6) alkyl; R7 and R8 are independently and selected from H, (C1-C6) alkyl and substituted (C1-C6) alkyl; E and W are independently and selected from chemical bonds, O, S or NR6; R1, R2, R3 and R4 are independently and selected from H, (C1-C4) alkyl, (C1-C4) alkoxy or halo compounds; T and L together are combined and selected from 5 to 8-membered unsaturated ring; n is 0 to 3; m is 0 to 2; m' is 0 to 2; l is 0 to 3; p is 0 to 3; x is 0 to 3 (provided that m+m' is 0 to 2 and l+p is 0 to 3); when A is O, S or NR3, n is 1; when either E or W is a chemical bond, l+p is 1 to 3; and either E or W is O, S or NR3); and optionally, at least one of ethylene- or acetylene-unsaturated monomers.
AbstractList PURPOSE: Provided are a polymer containing at least one of cyclic olefin monomers having fused cyclic electron taking groups as a polymerization unit, a method for preparing the polymer and a photo-resist composition containing the polymer as a resin binder to form relief images. CONSTITUTION: The polymer comprises at least one of cyclic olefine monomers defined as the following formula(1) or (2) (wherein A is O, S, CR7R8 or NR5; R5 is phenyl, substituted phenyl, benzyl, substituted benzyl, (C1-C6) alkyl or substituted (C1-C6) alkyl; Z is O, S or NR6; R6 is (C1-C6) alkyl or substituted (C1-C6) alkyl; R7 and R8 are independently and selected from H, (C1-C6) alkyl and substituted (C1-C6) alkyl; E and W are independently and selected from chemical bonds, O, S or NR6; R1, R2, R3 and R4 are independently and selected from H, (C1-C4) alkyl, (C1-C4) alkoxy or halo compounds; T and L together are combined and selected from 5 to 8-membered unsaturated ring; n is 0 to 3; m is 0 to 2; m' is 0 to 2; l is 0 to 3; p is 0 to 3; x is 0 to 3 (provided that m+m' is 0 to 2 and l+p is 0 to 3); when A is O, S or NR3, n is 1; when either E or W is a chemical bond, l+p is 1 to 3; and either E or W is O, S or NR3); and optionally, at least one of ethylene- or acetylene-unsaturated monomers.
Author BARCLAY GEORGE G
ZAMPINI ANTHONY
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Snippet PURPOSE: Provided are a polymer containing at least one of cyclic olefin monomers having fused cyclic electron taking groups as a polymerization unit, a method...
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SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
Title POLYMER AND PHOTORESIST COMPOSITION
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