POLYMER AND PHOTORESIST COMPOSITION
PURPOSE: Provided are a polymer containing at least one of cyclic olefin monomers having fused cyclic electron taking groups as a polymerization unit, a method for preparing the polymer and a photo-resist composition containing the polymer as a resin binder to form relief images. CONSTITUTION: The p...
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Main Authors | , |
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Format | Patent |
Language | English Korean |
Published |
26.09.2001
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: Provided are a polymer containing at least one of cyclic olefin monomers having fused cyclic electron taking groups as a polymerization unit, a method for preparing the polymer and a photo-resist composition containing the polymer as a resin binder to form relief images. CONSTITUTION: The polymer comprises at least one of cyclic olefine monomers defined as the following formula(1) or (2) (wherein A is O, S, CR7R8 or NR5; R5 is phenyl, substituted phenyl, benzyl, substituted benzyl, (C1-C6) alkyl or substituted (C1-C6) alkyl; Z is O, S or NR6; R6 is (C1-C6) alkyl or substituted (C1-C6) alkyl; R7 and R8 are independently and selected from H, (C1-C6) alkyl and substituted (C1-C6) alkyl; E and W are independently and selected from chemical bonds, O, S or NR6; R1, R2, R3 and R4 are independently and selected from H, (C1-C4) alkyl, (C1-C4) alkoxy or halo compounds; T and L together are combined and selected from 5 to 8-membered unsaturated ring; n is 0 to 3; m is 0 to 2; m' is 0 to 2; l is 0 to 3; p is 0 to 3; x is 0 to 3 (provided that m+m' is 0 to 2 and l+p is 0 to 3); when A is O, S or NR3, n is 1; when either E or W is a chemical bond, l+p is 1 to 3; and either E or W is O, S or NR3); and optionally, at least one of ethylene- or acetylene-unsaturated monomers. |
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Bibliography: | Application Number: KR20010009591 |