Chiller system with circulation structure of integrated valve unit for fluid temperature control of semiconductor processing equipment

• Main Authors: LEE YOUNG CHUL, SHIN BYEONG HYUN, CHAE YONG BAE, SONG KEUN YONG
• Format: Patent
• Language: English; Korean
• Published: 06.12.2022
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; COLD ROOMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; COOLING OR FREEZING APPARATUS NOT COVERED BY ANY OTHERSUBCLASS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; HEAT PUMP SYSTEMS; HEATING; ICE-BOXES; LIGHTING; LIQUEFACTION SOLIDIFICATION OF GASES; MANUFACTURE OR STORAGE OF ICE; MECHANICAL ENGINEERING; REFRIGERATION OR COOLING; REFRIGERATORS; SEMICONDUCTOR DEVICES; WEAPONS

The present invention relates to a chiller system having a circulation structure of an integrated valve unit for controlling temperature of a fluid in a semiconductor processing facility. More specifically, a system requiring at least four valves for controlling multiple flow paths is formed as a single unit, wherein the valves are required to mix and distribute a fluid and enable the fluid to bypass the flow path to mix coolants of different temperatures supplied from two or more sources by using an electronic valve and adjust the coolant to a processing temperature required by a facility. Therefore, the chiller system having the circulation structure of the integrated valve unit for controlling the temperature of a fluid in a semiconductor processing facility is improved to achieve a constant supply of a flow rate, a drop of pressure, and a reduction of response time by outputting the fixed flow rate while satisfying a temperature condition. The chiller system having the circulation structure of the integrated valve unit for controlling the temperature of a fluid in a semiconductor processing facility is formed to circulate the coolant by including a cold channel (Ch1), a hot channel (Ch 2), a supply line (SL), and a return line (RL). 본 발명은 반도체 공정 설비의 유체 온도조절을 위한 일체형 밸브유닛의 순환구조를 갖는 칠러 시스템에 관한 것으로, 보다 상세하게는 두 개 이상의 소스로부터 공급된 서로 다른 온도의 쿨런트를 전자식 밸브로 혼합하여 설비에서 요구하는 공정 온도로 맞추기 위해 유체를 믹싱, 분배, 바이패스시킬 때 필요한 다수개의 유로 제어를 위한 최소 4개의 밸브가 필요한 시스템을 한 개의 유닛으로 구현하여 온도조건을 만족하면서 일정한 유량으로 출력함으로써 유량의 일정한 공급, 압력강하 및 응답시간의 저감 등을 달성할 수 있도록 개선된 반도체 공정 설비의 유체 온도조절을 위한 일체형 밸브유닛의 순환구조를 갖는 칠러 시스템에 관한 것이다.