INDUCTIVELY COUPLED PLASMA GENERATOR FOR TREATING EXHAUST GAS AND IGNITION SYSTEM FOR THE SAME

The present invention provides an inductively coupled plasma generator for processing exhaust gas to supply high voltage to an ignitor without a separated transformer. According to the present invention, the inductively coupled plasma generator comprises a plasma reactor installed on an exhaust pipe...

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Main Authors SIM GEON BO, BAE JIN HO, KIM MIN JAE
Format Patent
LanguageEnglish
Korean
Published 14.09.2020
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Abstract The present invention provides an inductively coupled plasma generator for processing exhaust gas to supply high voltage to an ignitor without a separated transformer. According to the present invention, the inductively coupled plasma generator comprises a plasma reactor installed on an exhaust pipe through which exhaust gas generated from a process chamber of semiconductor manufacturing equipment is discharged and a power source supplying alternating current (AC) power to the plasma reactor. The plasma reactor comprises: a reaction chamber; a magnetic core disposed to surround the reaction chamber; a first coil wound on the magnetic core and supplying power of a radio frequency from the power source; a second coil wound on the magnetic core while being separated from the first coil; and an ignitor connected to the second coil and installed in the reaction chamber to ignite plasma. The winding number of the first coil is greater than that of the second coil, such that AC power greater than the AC power applied to the first coil is generated in the second coil by the power and is supplied to the ignitor. 본 발명에 의하면, 반도체 제조설비의 공정챔버에서 발생한 배기가스가 배출되는 배기관 상에 설치되는 플라즈마 반응기; 및 상기 플라즈마 반응기에 교류 전력을 공급하는 전원을 포함하며, 상기 플라즈마 반응기는, 반응 챔버와, 상기 반응 챔버를 감싸도록 배치되는 마그네틱 코어와, 상기 마그네틱 코어에 권선되고 상기 전원으로부터 무선주파수의 전력이 인가되는 제1 코일과, 상기 마그네틱 코어에 상기 제1 코일과 분리되어서 권선되는 제2 코일과, 상기 제2 코일과 연결되고 플라즈마 점화를 위해 상기 반응 챔버에 설치되는 점화기를 구비하며, 상기 제1 코일의 권선수보다 상기 제2 코일의 권선수가 커서 상기 제2 코일에는 상기 전원에 의해 상기 제1 코일에 인가되는 교류 전력의 전압보다 큰 교류 전력이 발생하여 상기 점화기로 공급되는 배기가스 처리용 유도결합 플라즈마 발생장치가 제공된다.
AbstractList The present invention provides an inductively coupled plasma generator for processing exhaust gas to supply high voltage to an ignitor without a separated transformer. According to the present invention, the inductively coupled plasma generator comprises a plasma reactor installed on an exhaust pipe through which exhaust gas generated from a process chamber of semiconductor manufacturing equipment is discharged and a power source supplying alternating current (AC) power to the plasma reactor. The plasma reactor comprises: a reaction chamber; a magnetic core disposed to surround the reaction chamber; a first coil wound on the magnetic core and supplying power of a radio frequency from the power source; a second coil wound on the magnetic core while being separated from the first coil; and an ignitor connected to the second coil and installed in the reaction chamber to ignite plasma. The winding number of the first coil is greater than that of the second coil, such that AC power greater than the AC power applied to the first coil is generated in the second coil by the power and is supplied to the ignitor. 본 발명에 의하면, 반도체 제조설비의 공정챔버에서 발생한 배기가스가 배출되는 배기관 상에 설치되는 플라즈마 반응기; 및 상기 플라즈마 반응기에 교류 전력을 공급하는 전원을 포함하며, 상기 플라즈마 반응기는, 반응 챔버와, 상기 반응 챔버를 감싸도록 배치되는 마그네틱 코어와, 상기 마그네틱 코어에 권선되고 상기 전원으로부터 무선주파수의 전력이 인가되는 제1 코일과, 상기 마그네틱 코어에 상기 제1 코일과 분리되어서 권선되는 제2 코일과, 상기 제2 코일과 연결되고 플라즈마 점화를 위해 상기 반응 챔버에 설치되는 점화기를 구비하며, 상기 제1 코일의 권선수보다 상기 제2 코일의 권선수가 커서 상기 제2 코일에는 상기 전원에 의해 상기 제1 코일에 인가되는 교류 전력의 전압보다 큰 교류 전력이 발생하여 상기 점화기로 공급되는 배기가스 처리용 유도결합 플라즈마 발생장치가 제공된다.
Author BAE JIN HO
KIM MIN JAE
SIM GEON BO
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DocumentTitleAlternate 배기가스 처리용 유도결합 플라즈마 발생장치 및 이를 위한 점화 시스템
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Snippet The present invention provides an inductively coupled plasma generator for processing exhaust gas to supply high voltage to an ignitor without a separated...
SourceID epo
SourceType Open Access Repository
SubjectTerms ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEPARATION
TRANSPORTING
Title INDUCTIVELY COUPLED PLASMA GENERATOR FOR TREATING EXHAUST GAS AND IGNITION SYSTEM FOR THE SAME
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