METHOD AND DEVICE FOR END POINT DETECTION

• Main Authors: MAEJIMA HIROSHI, WAKIYAMA FUMITOSHI, SEKIGUCHI KOICHIRO, OKABE TSUTOMU, KAMIOKA TETSUYA, HANAJIMA SHUICHI
• Format: Patent
• Language: English
• Published: 30.04.1987
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PURPOSE:To improve the accuracy for detecting an end point of etching by a method wherein, when dry etching is performed on a thin film formed on the surface of a semiconductor wafer to form a prescribed pattern, different wavelengths of emission spectrums emitted from the thin film are combined and...