RESIST PROCESSOR

• Main Authors: KIRITA KEI, SHINOZAKI TOSHIAKI, KATOU YOSHIHIDE
• Format: Patent
• Language: English
• Published: 28.01.1986
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To avoid any uneven temperature decline on a substrate to be processed in transit by a method wherein at least two processors among a series of resist processors are made movable from the substrate to be processed. CONSTITUTION:A substrate 3 to be processed which is coated with resist and delivered within a cassette is taken out one by one and forwarded to the position of a specimen stage mechanism 1 to be placed on a rotary specimen stage 2. Next a heater 5 is shifted to the position of mechanism 1 to make a heating housing 15 engage with a housing 8 for heating the substrate 3 by the heater 5. Later the heater 5 is shifted from the mechanism 1 and a refrigerator 6 is advanced to the position of mechanism 1 to make a cooling housing 17 of refrigerator 6 engage with the housing 8 so that refrigerant may be jetted from multiple nozzles 21 to the substrate 3 for rapidly cooling the substrate 3. After finishing the refrigeration, a shutter 22 is closed to block the nozzles 21. When the heating and cooling operations are finished through these procedures, the refrigerator may be shifted.