PRODUCTION OF MODIFIED VINYL RESIN

PURPOSE:To produce a modified vinyl resin excellent in gloss, heat resistance, weather resistance, etc., by reacting hydroxyl groups of a specified vinyl polymer with an isocyanatoorganosilane. CONSTITUTION:A hydroxyl group-containing vinyl polymer of a hydroxyl value of 20-200, a MW of 500-10,000 a...

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Bibliographic Details
Main Authors NAKAJIMA SHUNICHI, KURIYAMA SATOSHI
Format Patent
LanguageEnglish
Published 24.05.1986
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Summary:PURPOSE:To produce a modified vinyl resin excellent in gloss, heat resistance, weather resistance, etc., by reacting hydroxyl groups of a specified vinyl polymer with an isocyanatoorganosilane. CONSTITUTION:A hydroxyl group-containing vinyl polymer of a hydroxyl value of 20-200, a MW of 500-10,000 and a functionality >=1 is obtained by radical- polymerizing 5-80wt% hydroxyl group-containing monomer [e.g., hydroxyethyl (meth)acrylate] with 20-95wt% (meth)acrylonitrile and/or aromatic hydrocarbon vinyl monomer (e.g., styrene) and 0-20wt% other polymerizable monomers (e.g., ethylene) at 50-150 deg.C. The hydroxyl groups of this polymer are reacted with an isocyanatoorganosilane of the formula (wherein R1 is a bivalent organic group, R2 is H or a 1-4C alkyl, R3 is a 1-4C alkyl, and a is 1-3) at 0-150 deg.C and a molar ratio of 1:0.01-1.2 to obtain a modified vinyl resin of a Si content of 0.5-5.2wt% and a MW of 760-15,000.
Bibliography:Application Number: JP19840229890