FORMATION OF CARBONACEOUS HIGHLY FUNCTIONAL MATERIAL THIN FILM BY ELECTRON BEAM-EXCITED PLASMA CVD

• Main Authors: BAN MASAHITO, MORI YUKITAKA, RIYUUJI MAKOTO, TOKAI MASAKUNI
• Format: Patent
• Language: English
• Published: 06.10.1998
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a method for forming a thin film of a high-hardness, carbonaceous highly functional material, especially the thin film excellent in adhesion to a substrate, utilizing electron beam-excited CVD with a device using a simpler process and enhanced in productivity. SOLUTION: In the electron beam-excited CVD, a carbon-contg. raw gas is introduced into a vacuum vessel contg. a substrate and irradiated with an electron beam to produce plasma of the raw gas. A negative voltage at 100 to 200 V is impressed on the substrate to form a high-hardhess carbonaceoeous thin film on the substrate. The electron accelerating voltage is preferably controlled to >=50 V in an electron-beam gun. Further, the negative bias voltage to be impressed on the substrate is controlled to >=200 V in the preceding stage and to 100-200 V in the succeeding stage to improve the adhesion.