ROTARY BARREL DEVICE FOR PLATING AND ITS USE METHOD

PURPOSE: To make it possible to apply high-quality plating even on materials which are to be plated and are liable to float. CONSTITUTION: This rotary barrel device consists of a rotary barrel B which is rotatable around an axis X and has a hollow cylindrical shape having a circular outer peripheral...

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Bibliographic Details
Main Authors OTA CHUICHI, UCHIYAMA HIROTAKA
Format Patent
LanguageEnglish
Published 23.04.1996
Edition6
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Summary:PURPOSE: To make it possible to apply high-quality plating even on materials which are to be plated and are liable to float. CONSTITUTION: This rotary barrel device consists of a rotary barrel B which is rotatable around an axis X and has a hollow cylindrical shape having a circular outer peripheral surface 11 around the axis X and is formed with many through-holes 12 communicating with the interior and the exterior at its outer peripheral surface and a suction means A which is arranged below the barrel and has suction ports 31 having the length extending to the overall length of the outer peripheral surface 11 and the required width in order to suck the materials to be plated with the flow of liquid in a plating stage, to suck the plating liquid, etc., in a recovering stage and to suck dry air, etc., in a drying stage. As a result, the electrodeposition efficiency is improved and the plating time is shortened.
Bibliography:Application Number: JP19940248802