TARGET FOR SPUTTERING

PURPOSE:To prevent the irradiation of bar-shaped base materials with electrons and to obtain high-quality sputtering films by joining coating materials consisting of the same material as the material of targets to the exposed parts formed at the ends of target materials and inclining the joint surfa...

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Bibliographic Details
Main Authors YASUKAWA TAKAMASA, MASHIMA MUNETAKA
Format Patent
LanguageEnglish
Published 01.03.1994
Edition5
Subjects
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Summary:PURPOSE:To prevent the irradiation of bar-shaped base materials with electrons and to obtain high-quality sputtering films by joining coating materials consisting of the same material as the material of targets to the exposed parts formed at the ends of target materials and inclining the joint surfaces of both. CONSTITUTION:A target constituting body consists of the cylindrical base material 2 made of metal and the target material 3 joined to the outside surface of the base material 2. The end of the target constituting body is removed to form the exposed part of the base material 2 and thereafter, a projecting part having a circular truncated cone shape is formed on the outside surface at the end of the target material 3 to form a butt surface. On the other hand, a pair of the coating materials 5, 6 having a semicircular sectional shape are formed of the same material as the target materials 3. The inclination at the ends of the coating materials 5, 6 is set at the same angle as the angle of the inclination of the butt surfaces of the target materials 3. The coating materials 5, 6 are so mounted and joined as to hold the exposed parts of the target constituting bodies therebetween and both ends of the coating materials 5, 6 are connected to the butt surfaces of the target materials 3, by which the long-sized target T is obtd.
Bibliography:Application Number: JP19920211829