PHOTOSENSITIVE COMPOSITION

• Main Authors: MIYAGAWA MASASHI, NODA MARIKO, OOHAYASHI HIROHARU, MINAMI TORU
• Format: Patent
• Language: English
• Published: 27.02.1992
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PURPOSE:To provide the photosensitive composition hardenable in high sensitivity by cationic polymerization in spite of containing a colorant by incorporating a cationically polymerizable compound, a photopolymerization initiator, a condensed type azo pigment, and a sensitizer in the composition. CO...