THIOXANTHONE-BASED COMPOUND AND PHOTOSENSITIVE COMPOSITION

• Main Authors: NODA MARIKO, OOHAYASHI HIROHARU, MINAMI TORU, HASEGAWA KENICHI
• Format: Patent
• Language: English
• Published: 29.01.1992
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTROGRAPHY; FILLING PASTES; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

NEW MATERIAL:A compound expressed by formula I [R is H or methyl ; A is 1-7C alkylene; Y and Y' are 1-6C alkyl(thio), 1-6C alkoxy, halogeno, nitro, amino, 1-6C (hydroxy)alkylamino, 1-6C alkanoylamino, sulfonamide or acetyl; n is 1-4; m and q are 0-3]. EXAMPLE:A compound expressed by formula II....