ION BEAM PROCESS METHOD

• Main Authors: HARAICHI SATOSHI, SHIMASE AKIRA, AZUMA JUNZO, TAKAHASHI TAKAHIKO, ITO FUMIKAZU
• Format: Patent
• Language: English
• Published: 22.04.1992
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PURPOSE:To form a mark with high detecting accuracy without adding photo process, by carrying out a process of high process selectivity, which generates locally a great difference in process speed, in the case of mark material in comparison with the case of films laminated on its upper layer. CONSTI...