RETICLE

• Main Author: DAN MASAHIRO
• Format: Patent
• Language: English
• Published: 15.10.1990
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To clearly define a position of a cell pattern and to omit the trouble for searching the pattern at the time of measuring the dimension by containing in a lump the cell patterns for measuring the dimension provided on every file in a specific place of a reticle peripheral part, etc., in advance in a reticle used at the time of manufacturing an IC. CONSTITUTION:For instance, on the upper right end part of a reticle 14, cell patterns 15 for measuring the dimension of every file are provided in parallel in a lump and at intervals in the horizontal direction. The reticle 14 is constituted of a substrate on which a chrome film is provided as a light shielding film and a photoresist is applied. In such a way, without providing the pattern for measuring the dimension of every file to be synthesized on every file area, the cell patterns concerned 15 for measuring the dimension are contained in a lump in the peripheral part of the reticle 14, and its position is defined clearly. Accordingly, whether the pattern of the file which is changed at the time of a design change is realized in accordance with the instruction or not can be confirmed without depending on the pattern of other file, and a failure can be analyzed quickly and surely.