PRODUCTION OF THIN FILM TRANSISTOR FOR MATRIX TYPE DISPLAY DEVICE

• Main Authors: OURA MICHIYA, OKI KENICHI, YANAI KENICHI, ENDO TETSURO, KAMATA TAKESHI
• Format: Patent
• Language: English
• Published: 26.06.1989
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE:To attain a contact hole forming stage and a gate pattern forming stage only by one resist coating stage, to simplify a production process and to reduce the cost of the title method by using image reversal photoresist. CONSTITUTION:An image reversal photoresist film 13 is formed by spin coat...