SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

• Main Author: NAKAI HITOSHI
• Format: Patent
• Language: English; Japanese
• Published: 14.05.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide a technique capable of suppressing sneaking of a liquid medicine, which is supplied to an upward principal surface in a substrate, to a downward principal surface.SOLUTION: A substrate processing method includes: a first holding state forming step of forming a state where a substrate 9 in such an attitude that a first principal surface 91 in which a pattern is formed is turned downward is held by a first chuck part 710 separately from a plurality of support pins 61 supporting the substrate 9 from a lower side; and a liquid medicine processing step of supplying a gas to a space at a lower side of the substrate 9 and supplying a liquid medicine to a second principal surface 92 which is turned upward in the substrate 9 while rotating the substrate 9, which is held by the first chuck part 710 separately from the plurality of support pins 61, around a vertically extending center axis J1. The first chuck part 710 includes a plurality of first chuck pins 71 which abut on an end face of a peripheral edge of the substrate 9 without abutting on a bottom face of the peripheral edge of the substrate 9, and the substrate 9 is held by the plurality of first chuck pins 71.SELECTED DRAWING: Figure 1 【課題】基板における上方を向く主面に供給された薬液が下方を向く主面へ回り込むことを抑制できる技術の提供。【解決手段】基板処理方法であって、パターンが形成された第１主面９１が下方を向く姿勢の基板９が、基板９を下方から支持する複数の支持ピン６１から離間して第１チャック部７１０で保持された状態を形成する、第１保持状態形成工程と、複数の支持ピン６１から離間して第１チャック部７１０に保持された基板９を、上下に延びる中心軸Ｊ１の周りで回転させつつ、基板９の下方の空間へガスを供給するとともに、基板９における上方を向く第２主面９２に薬液を供給する、薬液処理工程と、を備える。第１チャック部７１０は、基板９の周縁部下面に当接せずに基板９の周縁部端面に当接する第１チャックピン７１を複数備え、複数の第１チャックピン７１で基板９を保持する。【選択図】図１