OPTICAL PROCESSOR

• Main Authors: TAKEMOTO FUMITOSHI, YOSHIHARA KEITA, SHIMIZU AKIHIRO, YAMAMORI KENJI
• Format: Patent
• Language: English; Japanese
• Published: 28.02.2024
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL PROCESSES OF COMPOUNDING; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

To provide an optical processor which can stably and evenly perform processing even when ozone concentration in a chamber is reduced.SOLUTION: An optical processor comprises: a conveyance mechanism 5 which has a plurality of conveyance rollers 5a that conveys a workpiece W1; a main chamber 2 which includes a first carry-in port 2a and a first carry-out port 2b; a partition member 2p which partitions at least a portion between the plurality of conveyance rollers into a processing space and a retention space in a direction orthogonal to a conveyance direction of the workpiece and a rotational shaft direction of the conveyance roller in the main chamber; an ultraviolet light source which is arranged in the processing space of the main chamber and emits ultraviolet light having a main light emission wavelength of 200 nm or less toward one surface of the workpiece conveyed along the conveyance mechanism; a gas introduction port 21a which introduces a process gas G1 into the main chamber; and a carry-in sub-chamber 3 which has a second carry-in port 3a and a second carry-out port 3b and in which the second carry-out port 3b is connected with the first carry-in port 2a. At least a portion of the conveyance roller is positioned on the processing space side with respect to the partition member.SELECTED DRAWING: Figure 1 【課題】チャンバ内のオゾン濃度を低下させても安定して均質に処理できる光処理装置を提供する。【解決手段】ワークＷ１を搬送する、複数の搬送ローラ５ａを有する搬送機構５と、第一搬入口２ａと、第一搬出口２ｂとを有するメインチャンバ２と、メインチャンバ内において、ワークの搬送方向と、搬送ローラの回転軸方向とに直交する方向に関し、複数の搬送ローラの間の少なくとも一部を、処理空間と、滞留空間とに区画する仕切部材２ｐと、メインチャンバの処理空間内に配置され、搬送機構に沿って搬送されるワークの一面に向かって、主たる発光波長が２００ｎｍ以下の紫外光を出射する紫外光源と、メインチャンバ内にプロセスガスＧ１を導入するガス導入口２１ａと、第二搬入口３ａと、第二搬出口３ｂとを有し、第二搬出口３ｂが第一搬入口２ａに連絡された搬入サブチャンバ３とを備え、搬送ローラは、少なくとも一部が、仕切部材よりも処理空間側に位置する。【選択図】図１