METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM
To provide a method with which a transparent conductive film can be manufactured at low cost and in a short time.SOLUTION: A method for manufacturing a transparent conductive film of the invention includes: the step A of applying a metal nanowire coating liquid to a surface of a base material; the s...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
27.12.2023
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a method with which a transparent conductive film can be manufactured at low cost and in a short time.SOLUTION: A method for manufacturing a transparent conductive film of the invention includes: the step A of applying a metal nanowire coating liquid to a surface of a base material; the step B of applying the metal nanowire coating liquid to a rear surface of the base material; the step C of applying, after the step A and the step B, a protective layer forming composition to the surface of the base material; and the step D of applying the protective layer forming composition to the rear surface of the base material.SELECTED DRAWING: Figure 1
【課題】低コストかつ短時間で、透明導電性フィルムを製造することを可能とする方法を提供すること。【解決手段】 本発明の透明導電性フィルムの製造方法は、基材の表面に金属ナノワイヤ塗工液を塗工する工程Aと、基材の裏面に金属ナノワイヤ塗工液を塗工する工程Bと、工程Aおよび工程Bの後、基材の表面に保護層形成用組成物を塗工する工程Cと、基材の裏面に保護層形成用組成物を塗工する工程Dとを含む。【選択図】図1 |
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Bibliography: | Application Number: JP20220096607 |