SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

• Main Authors: YUN TAE WON, EOM SUNG HUN
• Format: Patent
• Language: English; Japanese
• Published: 17.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide a substrate processing apparatus and a substrate processing method for cleaning a lower portion of a substrate using ultrasonic waves in order to improve cleaning of the lower portion of the substrate.SOLUTION: A substrate processing apparatus 1000 includes a substrate support unit 1100,...