METHOD FOR MANUFACTURING TARGET AND SPUTTERING DEVICE

• Main Authors: TAKAHASHI NOBUAKI, MIURA HITOTSUGU, TANIGAWA TOMOYUKI, KATAYAMA RYUJI
• Format: Patent
• Language: English; Japanese
• Published: 18.04.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To simply and rationally manufacture a target material having high purity.SOLUTION: A method for manufacturing a target includes the steps of: providing a raw material vessel, in which a granular raw material of a low melting point metal or low melting point alloy is stored, on a placing base installed in a treatment vessel; decompressing inside of the treatment vessel to a predetermined degree of vacuum; and heating the raw material vessel in the decompressed treatment vessel to melt the granular raw material in the raw material vessel and form a target material of the low melting point metal or low melting point alloy.SELECTED DRAWING: Figure 1 【課題】純度の高いターゲット材を簡便かつ合理的に製造する。【解決手段】処理容器内に設けられた載置台に低融点金属又は低融点合金の粒状原料が納められた原料容器を準備する工程と、前記処理容器内を所定の真空度まで減圧する工程と、前記減圧した前記処理容器内にて前記原料容器を加熱し、前記原料容器内で粒状原料を溶融し、前記低融点金属又は低融点合金のターゲット材を形成する工程と、を含むターゲットの製造方法が提供される。【選択図】図１