SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
To improve throughput in a substrate processing apparatus and to suppress the exclusive floor area thereof.SOLUTION: A substrate processing apparatus comprises: a carrier block comprising a plurality of carrier mounting portions each of which includes a substrate carry-in/carry-out carrier mounting...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
14.04.2023
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Abstract | To improve throughput in a substrate processing apparatus and to suppress the exclusive floor area thereof.SOLUTION: A substrate processing apparatus comprises: a carrier block comprising a plurality of carrier mounting portions each of which includes a substrate carry-in/carry-out carrier mounting portion; a processing block provided at one of right and left sides with respect to the carrier block; a first carrier mounting portion and a second carrier mounting portion which are the carrier mounting portions and provided side by side in a longitudinal direction in a planar view and at least one of which is the substrate carry-in/carry-out carrier mounting portion; a plurality of substrate mounting portions which are provided at one of right and left sides with respect to a substrate transportation region formed between the first carrier mounting portion and the second carrier mounting portion in the planar view, and are disposed side by side in a vertical direction; a first substrate transportation mechanism provided in the transportation region; and a second substrate transportation mechanism transferring a substrate between a first substrate mounting portion and a second substrate mounting portion which is included in the plurality of substrate mounting portions, and transfers the substrate to the processing block.SELECTED DRAWING: Figure 3
【課題】基板処理装置におけるスループットを高くすると共に、専有床面積を抑える。【解決手段】基板搬入出用のキャリア載置部を含む複数のキャリア載置部を備えるキャリアブロックと、キャリアブロックに対して左右の一方に設けられる処理ブロックと、各々キャリア載置部であると共に平面視で前後方向に並んで設けられ、少なくとも一方が基板搬入出用のキャリア載置部である第1キャリア載置部及び第2キャリア載置部と、平面視での第1キャリア載置部と前記第2キャリア載置部との間に形成される基板の搬送領域に対して左右の一方に設けられ、縦方向に並ぶ複数の基板載置部と、前記搬送領域に設けられる第1基板搬送機構と、第1基板載置部と、複数の基板載置部に含まれると共に処理ブロックに対して基板を受け渡すための第2基板載置部との間で、基板を受け渡す第2基板搬送機構と、を備える装置を構成する。【選択図】図3 |
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AbstractList | To improve throughput in a substrate processing apparatus and to suppress the exclusive floor area thereof.SOLUTION: A substrate processing apparatus comprises: a carrier block comprising a plurality of carrier mounting portions each of which includes a substrate carry-in/carry-out carrier mounting portion; a processing block provided at one of right and left sides with respect to the carrier block; a first carrier mounting portion and a second carrier mounting portion which are the carrier mounting portions and provided side by side in a longitudinal direction in a planar view and at least one of which is the substrate carry-in/carry-out carrier mounting portion; a plurality of substrate mounting portions which are provided at one of right and left sides with respect to a substrate transportation region formed between the first carrier mounting portion and the second carrier mounting portion in the planar view, and are disposed side by side in a vertical direction; a first substrate transportation mechanism provided in the transportation region; and a second substrate transportation mechanism transferring a substrate between a first substrate mounting portion and a second substrate mounting portion which is included in the plurality of substrate mounting portions, and transfers the substrate to the processing block.SELECTED DRAWING: Figure 3
【課題】基板処理装置におけるスループットを高くすると共に、専有床面積を抑える。【解決手段】基板搬入出用のキャリア載置部を含む複数のキャリア載置部を備えるキャリアブロックと、キャリアブロックに対して左右の一方に設けられる処理ブロックと、各々キャリア載置部であると共に平面視で前後方向に並んで設けられ、少なくとも一方が基板搬入出用のキャリア載置部である第1キャリア載置部及び第2キャリア載置部と、平面視での第1キャリア載置部と前記第2キャリア載置部との間に形成される基板の搬送領域に対して左右の一方に設けられ、縦方向に並ぶ複数の基板載置部と、前記搬送領域に設けられる第1基板搬送機構と、第1基板載置部と、複数の基板載置部に含まれると共に処理ブロックに対して基板を受け渡すための第2基板載置部との間で、基板を受け渡す第2基板搬送機構と、を備える装置を構成する。【選択図】図3 |
Author | TSUCHIYAMA MASASHI ENOKIDA SUGURU WATANABE TAKASHI IIDA NARIAKI IDE KOSEI |
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DocumentTitleAlternate | 基板処理装置及び基板処理方法 |
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Title | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
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