POLISHING PAD
To provide a polishing pad improved in level difference eliminating performance without greatly changing the composition/physical property of a polishing layer.SOLUTION: A polishing pad comprises a polishing layer having a polishing surface for polishing an object to be polished, and a cushion layer...
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Format | Patent |
Language | English Japanese |
Published |
05.04.2023
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Abstract | To provide a polishing pad improved in level difference eliminating performance without greatly changing the composition/physical property of a polishing layer.SOLUTION: A polishing pad comprises a polishing layer having a polishing surface for polishing an object to be polished, and a cushion layer arranged at an opposite side to the polishing surface of the polishing layer. Regarding a storage elastic modulus E' when the whole polishing pad is subjected to a dynamic viscoelasticity test in a bending mode by frequency dispersion (25°C), a ratio (E'1000/E'10) of an E' value (E'1000) of 1000 rad/s to an E' value (E'10) of 10 rad/s is 1-2.SELECTED DRAWING: Figure 1
【課題】 研磨層の組成・物性等を大きく変えることなく、段差解消性能が向上する研磨パッドを提供することを目的とする。【解決手段】 被研磨物を研磨加工するための研磨面を有する研磨層と、前記研磨層の研磨面と反対側に配置されるクッション層と、を備える研磨パッドであって、前記研磨パッド全体を曲げモードで周波数分散(25℃)による動的粘弾性試験を行った際の貯蔵弾性率E'について、1000rad/sのE'の値(E'1000)と10rad/sのE'の値(E'10)との比(E'1000/E'10)が1~2である、研磨パッド。【選択図】図1 |
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AbstractList | To provide a polishing pad improved in level difference eliminating performance without greatly changing the composition/physical property of a polishing layer.SOLUTION: A polishing pad comprises a polishing layer having a polishing surface for polishing an object to be polished, and a cushion layer arranged at an opposite side to the polishing surface of the polishing layer. Regarding a storage elastic modulus E' when the whole polishing pad is subjected to a dynamic viscoelasticity test in a bending mode by frequency dispersion (25°C), a ratio (E'1000/E'10) of an E' value (E'1000) of 1000 rad/s to an E' value (E'10) of 10 rad/s is 1-2.SELECTED DRAWING: Figure 1
【課題】 研磨層の組成・物性等を大きく変えることなく、段差解消性能が向上する研磨パッドを提供することを目的とする。【解決手段】 被研磨物を研磨加工するための研磨面を有する研磨層と、前記研磨層の研磨面と反対側に配置されるクッション層と、を備える研磨パッドであって、前記研磨パッド全体を曲げモードで周波数分散(25℃)による動的粘弾性試験を行った際の貯蔵弾性率E'について、1000rad/sのE'の値(E'1000)と10rad/sのE'の値(E'10)との比(E'1000/E'10)が1~2である、研磨パッド。【選択図】図1 |
Author | TATENO TEPPEI KAWAMURA YOSHIHIDE KURIHARA HIROSHI MATSUOKA RYUMA OCHI KEISUKE KAWASAKI TETSUAKI TAKAMIZAWA YAMATO |
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Snippet | To provide a polishing pad improved in level difference eliminating performance without greatly changing the composition/physical property of a polishing... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING |
Title | POLISHING PAD |
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