RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

To provide a resist composition excellent in all of sensitivity, roughness, and resolution, and a resist pattern forming method.SOLUTION: The resist composition contains: a resin component (A1) having a constituent unit (a0) which contains a lactone-containing cyclic group containing an acid-dissoci...

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Bibliographic Details
Main Authors ODASHIMA RIN, TODOROKI SEIJI, FUJINAMI TETSURO
Format Patent
LanguageEnglish
Japanese
Published 27.12.2022
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Summary:To provide a resist composition excellent in all of sensitivity, roughness, and resolution, and a resist pattern forming method.SOLUTION: The resist composition contains: a resin component (A1) having a constituent unit (a0) which contains a lactone-containing cyclic group containing an acid-dissociable group, an -SO2-containing cyclic group containing an acid-dissociable group, or a carbonate-containing cyclic group containing an acid-dissociable group; and a compound (B0) represented by formula (b0). X0 represents a bromine atom or an iodine atom; Rm represents a hydroxy group, an alkyl group, a fluorine atom or a chlorine atom; nb1 represents an integer of 1-5; nb2 represents an integer of 0-4; 1≤nb1+nb2≤5; Yb0 represents a divalent linking group or a single bond; Vb0 represents a single bond, an alkylene group or a fluorinated alkylene group; R0 represents a hydrogen atom, a C1-5 fluorinated alkyl group or a fluorine atom; Mm+ represents an m-valent organic cation; and m represents an integer of 1 or more.SELECTED DRAWING: None 【課題】感度、ラフネス、及び解像性がいずれも良好なレジスト組成物及びレジストパターン形成方法の提供。【解決手段】酸解離性基を含むラクトン含有環式基、酸解離性基を含む-SO2-含有環式基、又は酸解離性基を含むカーボネート含有環式基を含む構成単位(a0)を有する樹脂成分(A1)と、式(b0)で表される化合物(B0)と、を含有しする、レジスト組成物。X0は、臭素原子又はヨウ素原子。Rmは、ヒドロキシ基、アルキル基、フッ素原子、又は、塩素原子。nb1は1~5の整数。nb2は0~4の整数。1≦nb1+nb2≦5る。Yb0は、2価の連結基又は単結合。Vb0は、単結合、アルキレン基又はフッ素化アルキレン基で。R0は、水素原子、炭素原子数1~5のフッ素化アルキル基又はフッ素原子。Mm+は、m価の有機カチオン。mは1以上の整数。[化1]TIFF2022191046000096.tif35170【選択図】なし
Bibliography:Application Number: JP20210099663