INDUCTIVE COUPLING PLASMA EXCITATION ANTENNA, INDUCTIVE COUPLING PLASMA EXCITATION ANTENNA UNIT, AND PLASMA PROCESSING APPARATUS

• Main Authors: KURASHINA DAISUKE, FUJIWARA NAOKI, YAMAZAWA YOHEI, SAITO TAKENAO, NAKAJIMA TOSHIKI
• Format: Patent
• Language: English; Japanese
• Published: 31.08.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To improve the circumferential uniformity of magnetic field intensity while improving the magnetic field generation efficiency by an inductive coupling plasma excitation antenna when plasma is excited by using the antenna.SOLUTION: An inductive coupling plasma excitation antenna comprises: a plurali...