ION IMPLANTER AND PARTICLE DETECTION METHOD

• Main Authors: YAKIDA TAKANORI, NINOMIYA AKI, MORITA TAKEO, HIROSE SAYUMI
• Format: Patent
• Language: English; Japanese
• Published: 06.04.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To improve the detection accuracy of particles transported with an ion beam.SOLUTION: An ion implanter 10 includes a beamline device 14 that transports an ion beam, an injection processing chamber 16 in which the injection processing for irradiating a wafer W with an ion beam is performed, a lighting device 64 that emits illumination light L in a direction intersecting the transport direction of the ion beam in at least one of a beamline device 14 and an injection processing chamber 16, an imaging device 66 that captures an image of a space through which the illumination light L passes and generates an image, and a control device 60 that detects particles that scatter the illumination light L on the basis of the captured image.SELECTED DRAWING: Figure 1 【課題】イオンビームとともに輸送されるパーティクルの検出精度を高める。【解決手段】イオン注入装置１０は、イオンビームを輸送するビームライン装置１４と、イオンビームをウェハＷに照射する注入処理がなされる注入処理室１６と、ビームライン装置１４内および注入処理室１６内の少なくとも一方においてイオンビームの輸送方向と交差する方向に照明光Ｌを照射する照明装置６４と、照明光Ｌが通過する空間を撮像して撮像画像を生成する撮像装置６６と、撮像画像に基づいて照明光Ｌを散乱させるパーティクルを検出する制御装置６０と、を備える。【選択図】図１