SUBSTRATE TREATMENT APPARATUS

• Main Author: TAMURA SHO
• Format: Patent
• Language: English; Japanese
• Published: 16.03.2022
• Subjects: APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS; SEMICONDUCTOR DEVICES

To provide a substrate conveyor in which a substrate holder can be transported while another substrate holder is transported between a first stand and a stocker, and in which a maintenance area does not require a space where the substrate holder rotates.SOLUTION: A substrate treatment apparatus of the present invention is a substrate treatment apparatus for treating a substrate, comprising: a treatment tank for treating the substrate held in a tabular substrate holder; a first stand on which the substrate holder is placed in the horizontal posture, and on which the substrate is attached to and detached from the substrate holder; a first conveyor for transporting the substrate holder between the first stand and the treatment tank; a maintenance table on which the substrate holder is placed in the horizontal posture, and on which the maintenance of the substrate holder is performed; a stocker in which the substrate holder is stored in the horizontal posture; and a second conveyor for transporting the substrate holder kept in the horizontal posture between the first stand, the stocker, and the maintenance table.SELECTED DRAWING: Figure 7 【課題】第１乗せ台とストッカとの間で基板ホルダを搬送している間にも、他の基板ホルダを搬送でき、且つ基板ホルダが回転するための空間がメンテナンスエリアに必要ない、基板搬送装置を提供する。【解決手段】本開示に係る基板処理装置は、基板を処理するための基板処理装置であって、板状の基板ホルダに保持された基板を処理するための処理槽と、基板ホルダが水平姿勢で載置され、基板ホルダに対して基板の着脱が行われる第１乗せ台と、基板ホルダを、第１乗せ台と処理槽との間で搬送するための第１搬送装置と、基板ホルダが水平姿勢で載置され、基板ホルダのメンテナンスが行われるメンテナンス台と、基板ホルダが水平姿勢で収納されるストッカと、基板ホルダを、水平姿勢のままで、第１乗せ台とストッカとメンテナンス台との間で搬送するための第２搬送装置と、を備える。【選択図】図７