RETICLE POD PROVIDED WITH OPTICALLY IDENTIFIABLE MARKS AND METHOD FOR IDENTIFYING THE SAME

• Main Authors: CHUANG CHIA-HO, LEE YI-HSUAN, WEN HSING-MIN, CHIU MINGIEN, HSUEH HSIN-MIN
• Format: Patent
• Language: English; Japanese
• Published: 18.11.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a reticle pod provided with optically identifiable marks so as to allow its disposition to a correct site within a semiconductor processing device.SOLUTION: The invention discloses a reticle pod including a base and a lid mounted to the base. The base has a bottom surface (200) having at least one first mark (201) and at least one second mark (202). The first mark has a first reflectivity relative to a light source (311), and the second mark has a second reflectivity relative to the light source. The first reflectivity is different from the second reflectivity and also different from that of the rest area of the bottom surface.SELECTED DRAWING: Figure 2 【課題】半導体処理装置内の正しい場所に配置可能であるようにするための光学的に識別可能なマークを備えたレチクルポッドを提供する。【解決手段】本発明は、基部および基部に取り付けられる蓋を備えたレチクルポッドを開示する。基部は、少なくとも１つの第１のマーク（２０１）および少なくとも１つの第２のマーク（２０２）を備えた底面（２００）を有する。第１のマークは、光源（３１１）に対して第１の反射性を有し、第２のマークは、この光源に対して第２の反射性を有する。第１の反射性は、第２の反射性とは異なっており、しかも底面の残部領域の反射性とも異なっている。【選択図】図２