PHOTOSENSITIVE RESIN LAMINATE
To provide a photosensitive resin laminate having a mask layer element which can be removed by an aqueous developer, has good scratch resistance and maintains adhesion to a peelable protective layer.SOLUTION: A photosensitive resin laminate has a photosensitive resin layer, a mask layer element and...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
11.10.2021
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a photosensitive resin laminate having a mask layer element which can be removed by an aqueous developer, has good scratch resistance and maintains adhesion to a peelable protective layer.SOLUTION: A photosensitive resin laminate has a photosensitive resin layer, a mask layer element and a protective layer peelable from the mask layer element in this order on a support, in which the mask layer element contains polyvinyl alcohol, an anionic polymer and an infrared absorption substance.SELECTED DRAWING: None
【課題】水系現像液により除去可能であり、マスク層要素の耐傷性が良好でありかつ剥離可能な保護層と密着性を維持しているマスク層要素を有する感光性樹脂積層体を提供する。【解決手段】支持体上に感光性樹脂層、マスク層要素、マスク層要素から剥離可能な保護層をこの順に有する感光性樹脂積層体であって、マスク層要素が、ポリビニルアルコール、アニオン性ポリマー、赤外線吸収物質を含有する感光性樹脂積層体である。【選択図】 なし |
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Bibliography: | Application Number: JP20200062555 |