CONTAINER SYSTEM

To provide a container system in which a storage environment for a workpiece can be easily cleaned.SOLUTION: Disclosed is a container system comprising an inner base configured to receive a workpiece. The inner base includes: a first treatment region that corresponds to a workpiece accommodating reg...

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Bibliographic Details
Main Authors CHUANG CHIA-HO, WU TING-SYONG, LEE YI-HSUAN, CHIU MINGIEN, LIN SHU-HUNG
Format Patent
LanguageEnglish
Japanese
Published 30.09.2021
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:To provide a container system in which a storage environment for a workpiece can be easily cleaned.SOLUTION: Disclosed is a container system comprising an inner base configured to receive a workpiece. The inner base includes: a first treatment region that corresponds to a workpiece accommodating region; a second treatment region arranged around the first treatment region of the inner base; and a workpiece supporting post arranged at a border region between the first treatment region and the second treatment region.SELECTED DRAWING: Figure 2c 【課題】ワークピースの保管環境の清掃が容易な容器システムを提供する。【解決手段】本開示は、ワークピースを受け入れるように構成された内側ベースを備える容器システムを開示し、内側ベースは、ワークピース収容領域に対応する第１の処理領域と、内側ベースの第１の処理領域の周りに配置された第２の処理領域と、第１の処理領域と第２の処理領域との間の境界領域に配置されたワークピース支持ポストとを含む。【選択図】図２ｃ
Bibliography:Application Number: JP20210009517