SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

• Main Author: NAKAI HITOSHI
• Format: Patent
• Language: English; Japanese
• Published: 18.02.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide a substrate processing apparatus capable of lifting a first lift pin and a second lift pin independently of each other at a low cost.SOLUTION: A substrate processing apparatus 1 includes a substrate holding part 2, a rolling mechanism 3, a push-up member 241 and a rolling mechanism 242. The substrate holding part 2 includes a first lift pin and a second lift pin, a first action member and a second action member connected, respectively, with the first lift pin and the second lift pin. The rolling mechanism 3 rotates the substrate holding part 2 around a revolving shaft J1. The push-up member 241 faces the first action member in a first state where the substrate holding part 2 has stopped at a first relative rotational position, and faces the second action member in a second state where the substrate holding part 2 has stopped at a second relative rotational position. A lifting mechanism 242 raises the first lift pin by raising the push-up member 241 in the first state and pushing up the first action member, and raises the second lift pin by raising the push-up member 241 in the second state and pushing up the second action member.SELECTED DRAWING: Figure 2 【課題】低コストで第１リフトピンおよび第２リフトピンを互いに独立して昇降可能な基板処理装置を提供する。【解決手段】基板処理装置１は基板保持部２と回転機構３と押し上げ部材２４１と回転機構２４２とを備える。基板保持部２は、第１リフトピンおよび第２リフトピンと、第１リフトピンおよび第２リフトピンにそれぞれに連結される第１作用部材および第２作用部材とを含む。回転機構３は回転軸Ｊ１のまわりで基板保持部２を回転させる。押し上げ部材２４１は、基板保持部２が第１相対回転位置で停止した第１状態で第１作用部材と対向し、基板保持部２が第２相対回転位置で停止した第２状態で第２作用部材と対向する。昇降機構２４２は第１状態で押し上げ部材２４１を上昇させて第１作用部材を押し上げることにより、第１リフトピンを上昇させ、第２状態で押し上げ部材２４１を上昇させて第２作用部材を押し上げることにより、第２リフトピンを上昇させる。【選択図】図２