TREATMENT SOLUTION AND TREATMENT METHOD
To provide a treatment solution and a treatment method, capable of treating by-products produced by the method of depositing a silicon-containing material on a substrate in a highly secure manner, by using gas containing silicon and halogen.SOLUTION: According to an embodiment, there is provided a t...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
10.09.2020
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Subjects | |
Online Access | Get full text |
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