SILICON-CONTAINING RESIN COMPOSITION

• Main Authors: NODA KUNIHIRO, SHIODA MASARU, CHISAKA HIROKI, KUROKO MAYUMI
• Format: Patent
• Language: English; Japanese
• Published: 20.08.2020
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; COMPOUNDS THEREOF; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; INORGANIC CHEMISTRY; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-METALLIC ELEMENTS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; USE OF MATERIALS THEREFOR; WOODSTAINS

To provide a silicon-containing resin composition capable of forming a silica-based coating film in which generation of cracks is minimized, a method for forming the silica-based coating film using the silicon-containing resin composition, and a crack-free silica-based coating film formed using the silicon-containing resin composition.SOLUTION: A silicon-containing resin composition includes a silicon-containing resin (A) and a solvent (S), in which one or more selected from among siloxane resins and polysilanes are used as the silicon-containing resin (A), and the solvent (S) contains a cycloalkyl acetate having a specific structure. As the cycloalkyl acetate, cyclohexyl acetate is preferably used.SELECTED DRAWING: None 【課題】クラックの発生が抑制されたシリカ系被膜を形成できるケイ素含有樹脂組成物と、当該ケイ素含有樹脂組成物を用いるシリカ系被膜の形成方法と、当該ケイ素含有樹脂組成物を用いて形成されたクラックのないシリカ系被膜とを提供する。【解決手段】（Ａ）ケイ素含有樹脂と、（Ｓ）溶剤とを含む、ケイ素含有樹脂組成物において、（Ａ）ケイ素含有樹脂として、シロキサン樹脂、及びポリシランから選択される１種以上を用い、特定の構造のシクロアルキルアセテートを（Ｓ）溶剤に含有させる。シクロアルキルアセテートとしては、シクロヘキシルアセテートが好適に使用される。【選択図】なし