MICROWAVE PLASMA PROCESSING DEVICE
To provide a microwave plasma processing device capable of easily manufacturing a device capable of uniformly generating plasma even when displacement due to thermal expansion occurs.SOLUTION: Since a feeder line 41 and an antenna 42 are not physically in contact with each other, even when displacem...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
19.03.2020
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Subjects | |
Online Access | Get full text |
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