SiC SEMICONDUCTOR DEVICE

To provide an SiC semiconductor device that can reduce the influence of a modified line on an SiC semiconductor layer.SOLUTION: An SiC semiconductor device 1 includes an SiC semiconductor layer 2 including an SiC single crystal, and having a first main surface 3 as an element formation surface, a se...

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Bibliographic Details
Main Authors NAKANO YUUKI, UENO MAYA, KUTSUMA YASUNORI, NAKAZAWA SEIYA, HARUYAMA SAWA, KAWAKAMI YASUHIRO
Format Patent
LanguageEnglish
Japanese
Published 20.02.2020
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