SiC SEMICONDUCTOR DEVICE
To provide an SiC semiconductor device that can reduce the influence of a modified line on an SiC semiconductor layer.SOLUTION: An SiC semiconductor device 1 includes an SiC semiconductor layer 2 including an SiC single crystal, and having a first main surface 3 as an element formation surface, a se...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English Japanese |
Published |
20.02.2020
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!