SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, INVERTER CIRCUIT, DRIVE DEVICE, VEHICLE, AND ELEVATOR

To provide a semiconductor device having a high carrier mobility.SOLUTION: A semiconductor device comprises: a silicon carbide layer; a gate electrode; a gate insulating layer provided between the silicon carbide layer and the gate electrode; a first region provided in the silicon carbide layer and...

Full description

Saved in:
Bibliographic Details
Main Authors ITO TOSHIHIDE, IIJIMA RYOSUKE, SHIMIZU TATSUO, FUKATSU SHIGETO, ASABA SHUNSUKE, NAKABAYASHI YUKIO
Format Patent
LanguageEnglish
Japanese
Published 03.10.2019
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:To provide a semiconductor device having a high carrier mobility.SOLUTION: A semiconductor device comprises: a silicon carbide layer; a gate electrode; a gate insulating layer provided between the silicon carbide layer and the gate electrode; a first region provided in the silicon carbide layer and that contains nitrogen (N); and a second region provided between the first region and the gate insulating layer and that contains at least one element selected from a group consisting of nitrogen (N), phosphor (P), arsenic (As), antimony (Sb), scandium (Sc), yttrium (Y), lanthanum (La), lanthanoids (Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu), hydrogen (H), deuterium (D) and fluorine (F).SELECTED DRAWING: Figure 1 【課題】キャリアの移動度が高い半導体装置を提供する。【解決手段】実施形態の半導体装置は、炭化珪素層と、ゲート電極と、炭化珪素層とゲート電極との間に設けられたゲート絶縁層と、炭化珪素層の中に設けられ、窒素(N)を含有する第1の領域と、第1の領域とゲート絶縁層との間に設けられ、窒素(N)、リン(P)、ヒ素(As)、アンチモン(Sb)、スカンジウム(Sc)、イットリウム(Y)、ランタン(La)、ランタノイド(Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu)、水素(H)、重水素(D)、フッ素(F)から成る群から選ばれる少なくとも一つの元素を含有する第2の領域と、を備える。【選択図】図1
Bibliography:Application Number: JP20180053609