DEVICE

• Main Authors: WATSON DOUGLAS C, NOVAK THOMAS W, HAZELTON ANDREW J
• Format: Patent
• Language: English; Japanese
• Published: 22.03.2019
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide an environmental system that controls an environment of a gap between a light assembly and a device and includes a fluid barrier, an immersion liquid system, and a transportation region, in which the transportation region captures an immersion liquid flowing out of the gap and prevents leakage of the liquid, and avoids the use of direct vacuum-sucking that may deform the device and/or optical assembly.SOLUTION: A liquid barrier 254 is positioned near a device, and maintains a transportation region near a gap. An immersion liquid system 252 feeds an immersion liquid 248 filling a gap 246. The transportation region transports at least a part of the immersion liquid 248 present in the vicinity of a liquid barrier 254 and the device so as to depart from the device. The immersion liquid system 252 may contain a liquid removal system 282 in communication with the transportation region 256. The transportation region 256 may be formed of a porous material.SELECTED DRAWING: Figure 2B 【課題】光アセンブリとデバイスの間のギャップの環境を制御する環境システムは、流体バリア、液浸流体システム、及び移送領域を含む。移送領域は、ギャップから出る液浸流体を捕え流体の漏出を防ぐとともに、デバイス及び／又は光学アセンブリを変形させる可能性のある直接的な減圧吸引をデバイスに使用することを回避する環境システムを提供する。【解決手段】流体バリア２５４は、デバイスの近くに位置付けられ、移送領域をギャップの近くに維持する。液浸流体システム２５２は、ギャップ２４６を充たす液浸流体２４８を供給する。移送領域は、流体バリア２５４、及びデバイスの近くにある液浸流体２４８の少なくとも一部をデバイスから離れるように移送する。液浸流体システム２５２は、移送領域２５６と流通している流体除去システム２８２を含むことができる。移送領域２５６は多孔性材料で製作できる。【選択図】図２Ｂ