ALIGNMENT METHOD AND ALIGNMENT DEVICE, AND VACUUM VAPOR DEPOSITION METHOD AND VACUUM VAPOR DEPOSITION DEVICE INCLUDING THE SAME

• Main Authors: TANI KAZUNORI, NAGANUMA YOSHITO, UCHIDA WATARU
• Format: Patent
• Language: English; Japanese
• Published: 14.03.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; METALLURGY; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING

To improve precision of position alignment between a substrate and a mask more.SOLUTION: An alignment method includes the processes of: photographing an alignment mark by optical means to obtain image data; and comparing the obtained image data with a model image to detect the position of the alignment mark. The alignment method comprises: detecting, when a focus value of the image data obtained in the process of obtaining the image data is within a predetermined range including a peak value, the position of the alignment mark in the position detecting process through real image processing in which the obtained image data is compared with a first model image obtained through photography of the alignment mark in advance; and detecting, when the focus value deviates from the predetermined range, the position of the alignment mark in the position detecting process through artificial image processing in which the obtained image data is compared with a second model image generated based upon design data on the alignment.SELECTED DRAWING: Figure 10 【課題】基板とマスクの位置整列の精度をさらに改善させる。【解決手段】光学手段でアライメントマークを撮影して画像データを得る工程と、得られた前記画像データをモデル画像と比較して、前記アライメントマークの位置を検出する工程とを含み、前記画像データを得る工程で得られた前記画像データのフォーカス値がピーク値を含む所定の範囲内の場合は、前記位置検出工程において、得られた前記画像データを、予め前記アライメントマークの撮影を通じて得られた第１のモデル画像と比較する実画像処理によって前記アライメントマークの位置を検出し、前記フォーカス値が前記所定の範囲を外れる場合は、前記位置検出工程において、得られた前記画像データを、前記アライメントマークの設計データに基づいて作成された第２のモデル画像と比較する人工画像処理によって前記アライメントマークの位置を検出する。【選択図】図１０