LIQUID TREATMENT APPARATUS

• Main Authors: KITAI TAKAHIRO, MATSUDA GENICHIRO, YAMADA YOSHIO, MIYAKE TAKESHI
• Format: Patent
• Language: English; Japanese
• Published: 13.12.2018
• Subjects: CHEMISTRY; METALLURGY; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

To provide a liquid treatment apparatus possible to efficiently generate plasma and promptly decompose chlorine component of liquid, thereby shortening treatment time, increasing purification ability and chlorine removal ability, stabilizing discharge due to no need for air introduction, and possible to suppress generation of nitrite, which is a harmful substance.SOLUTION: An apparatus includes: a treatment tank 12 for generating a gas phase G in the vicinity of a swirling center of a swirling flow F1 of liquid L1 by swirling the introduced liquid L1; a first electrode 30 disposed at least partly in the treatment tank and contacting the liquid in the treatment tank; a second electrode 31 disposed so as to be in contact with the liquid in the treatment tank; and a power source 60 for applying a voltage between the first electrode and the second electrode to generate plasma in the gas phase. Plasma is generated in the gas phase to generate a reformed component, the produced reformed component is dissolved in the liquid and is dispersed in the liquid to form a treatment liquid. Then, the chlorine component of water 42 in the treatment tank 41 is decomposed using the generated treatment liquid, and thereafter for-treatment water is introduced into the treatment tank from the treatment tank 41.SELECTED DRAWING: Figure 6D 【課題】プラズマを効率良く発生させて液体の塩素成分分解処理を迅速に行うことができて処理時間が短縮でき、浄化能力及び塩素除去能力が高まり、空気導入不要で放電が安定するとともに、有害物質である亜硝酸の生成を抑制することができる液体処理装置を提供する。【解決手段】導入された液体Ｌ１を旋回させることにより、液体Ｌ１の旋回流Ｆ１の旋回中心付近に気相Ｇを発生させる処理槽１２と、処理槽内に少なくとも一部が配置されて処理槽内の液体に接触する第１電極３０と、処理槽内の液体に接触するように配置された第２電極３１と、第１電極と第２電極との間に電圧を印加して気相にプラズマを発生させる電源６０とを備えて、気相にプラズマを発生させて改質成分を生成し、生成した改質成分が液体に溶解して液体中に分散して、処理液を生成し、生成した処理液で被処理槽４１内の水４２の塩素成分を分解したのち、被処理槽４１から被処理水を処理槽に導入する。【選択図】図６Ｄ