COATING TREATMENT DEVICE AND CUP
PROBLEM TO BE SOLVED: To prevent scattering of a coating liquid onto a wafer surface after the coating liquid bounces on an air flow control plate disposed in a cup in a coating treatment device for coating a substrate with the coating liquid by a rotary system.SOLUTION: A resist coating device incl...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
04.10.2018
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Subjects | |
Online Access | Get full text |
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