FLUORINE-CONTAINING MONOMER, FLUORINE-CONTAINING POLYMER AND COMPOSITION FOR FORMING PATTERN USING THE SAME, AND METHOD FOR FORMING THE PATTERN
PROBLEM TO BE SOLVED: To provide a composition for forming a pattern for obtaining a high definition pattern which suppresses wet-spreading and bleeding of ink by enhancing the lyophilicity of a lyophilic region and the liquid repellency of a liquid-repellent region in printed electronics and to pro...
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Format | Patent |
Language | English Japanese |
Published |
16.08.2018
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Abstract | PROBLEM TO BE SOLVED: To provide a composition for forming a pattern for obtaining a high definition pattern which suppresses wet-spreading and bleeding of ink by enhancing the lyophilicity of a lyophilic region and the liquid repellency of a liquid-repellent region in printed electronics and to provide a fluorine-containing polymer contained in the same.SOLUTION: There is provided a fluorine-containing polymer containing a repeating unit represented by the formula (1): (Rfand Rfeach independently represents a fluorine-containing alkyl group having 1 to 3 carbon atoms; Rrepresents H or an organic group having 1 to 4 carbon atoms; A represents H, F or a methyl group; L each independently represents a methylene group, 1-methyl-methylene or 1,1-dimethylmethylene; n represents an integer of 0 to 10; P represents a group containing a divalent benzyl group derived from ethylene having a carbonyl group or a phenyl group in a side chain or having a methyl group as a repeating unit.)SELECTED DRAWING: None
【課題】プリンテッドエレクトロニクスにおいて親液部位の親液性と撥液部位の撥液性を高めインクの濡れ広がり且つ滲みを抑えた高精細なパターンを得る、パターン形成用組成物およびそれが含む含フッ素重合体を提供する。【解決手段】式(1)で表される繰り返し単位を含む含フッ素重合体。(Rf1及びRf2は夫々独立にC1〜3の含フッ素アルキル基;R3はH又はC1−4の有機基;AはH、F又はメチル基、Lは夫々独立にメチレン基、1−メチル−メチレン又は1,1−ジメチルメチレン;nは0〜10の整数;Pは側鎖にカルボニル基、フェニル基を有するエチレン由来又はメチル基を有する2価のベンジル基を繰り返し単位とする基)【選択図】なし |
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AbstractList | PROBLEM TO BE SOLVED: To provide a composition for forming a pattern for obtaining a high definition pattern which suppresses wet-spreading and bleeding of ink by enhancing the lyophilicity of a lyophilic region and the liquid repellency of a liquid-repellent region in printed electronics and to provide a fluorine-containing polymer contained in the same.SOLUTION: There is provided a fluorine-containing polymer containing a repeating unit represented by the formula (1): (Rfand Rfeach independently represents a fluorine-containing alkyl group having 1 to 3 carbon atoms; Rrepresents H or an organic group having 1 to 4 carbon atoms; A represents H, F or a methyl group; L each independently represents a methylene group, 1-methyl-methylene or 1,1-dimethylmethylene; n represents an integer of 0 to 10; P represents a group containing a divalent benzyl group derived from ethylene having a carbonyl group or a phenyl group in a side chain or having a methyl group as a repeating unit.)SELECTED DRAWING: None
【課題】プリンテッドエレクトロニクスにおいて親液部位の親液性と撥液部位の撥液性を高めインクの濡れ広がり且つ滲みを抑えた高精細なパターンを得る、パターン形成用組成物およびそれが含む含フッ素重合体を提供する。【解決手段】式(1)で表される繰り返し単位を含む含フッ素重合体。(Rf1及びRf2は夫々独立にC1〜3の含フッ素アルキル基;R3はH又はC1−4の有機基;AはH、F又はメチル基、Lは夫々独立にメチレン基、1−メチル−メチレン又は1,1−ジメチルメチレン;nは0〜10の整数;Pは側鎖にカルボニル基、フェニル基を有するエチレン由来又はメチル基を有する2価のベンジル基を繰り返し単位とする基)【選択図】なし |
Author | NADANO RYO KANEKO YUZURU SUDA KENSHI |
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DocumentTitleAlternate | 含フッ素単量体、含フッ素重合体およびそれを用いたパターン形成用組成物、およびそのパターン形成方法 |
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Snippet | PROBLEM TO BE SOLVED: To provide a composition for forming a pattern for obtaining a high definition pattern which suppresses wet-spreading and bleeding of ink... |
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SubjectTerms | CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PRINTED CIRCUITS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
Title | FLUORINE-CONTAINING MONOMER, FLUORINE-CONTAINING POLYMER AND COMPOSITION FOR FORMING PATTERN USING THE SAME, AND METHOD FOR FORMING THE PATTERN |
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