OBJECT PROCESSING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide an object processing method that can suppress occurrence of high heat due to laser irradiation in a separation layer in a method in which a target processing and movement are performed in a state in which an object is temporarily fixed on a support body.SOLUTION: An...

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Bibliographic Details
Main Authors OKITA KENZO, MARUYAMA YOICHIRO
Format Patent
LanguageEnglish
Japanese
Published 14.06.2018
Subjects
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