SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING SUBSTRATE HOLDER

• Main Authors: PETER VAN DELFT, RAYMOND WILHELMUS LOUIS LAFARRE, DZIOMKINA NINA VLADIMIROVNA, KARADE YOGESH PRAMOD, RHODENBURUK ELIZABETH COLIN
• Format: Patent
• Language: English; Japanese
• Published: 14.06.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a substrate table or substrate holder on which one or more electronic components, such as one or more thin-film components, are formed.SOLUTION: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentrations. A surface treatment may be applied to burls to repel a solution of a planarization layer material.SELECTED DRAWING: Figure 13 【課題】１つ又は複数の薄膜コンポーネントなどの１つ又は複数の電子コンポーネントがその上で形成される基板テーブル又は基板ホルダを提供する。【解決手段】リソグラフィ装置の基板ホルダは、その表面に設けられた平坦化層を有する。平坦化層は、電子コンポーネントを形成する薄膜スタックを形成するために滑らかな表面を提供する。平坦化層は実質的に均一な厚さである、及び／又はその外面は１０μｍ未満の山部から谷部までの距離を有する。平坦化層は、異なる濃度の２つの溶液を付与することによって形成することができる。バールに表面処理を施して、平坦化層材料の溶液を反発することができる。【選択図】図１３