PLASMA CVD DEVICE

• Main Author: IKEJIRI TAKASHI
• Format: Patent
• Language: English; Japanese
• Published: 15.03.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a technology capable of suppressing imperfect contact between an electrode and a bearing member, in a plasma CVD device.SOLUTION: A plasma CVD device includes a long-sized electrode extending in a horizontal direction, having one end and the other end, and provided with a holding part for holding a workpiece between one end and the other end, a first bearing member for bearing one end side rather than the holding part of the electrode at least from below, and a conductive second bearing member for bearing the other end side rather than the holding part of the electrode at least from below. The electrode includes a weight part furthermore on the other end side than the second bearing member.SELECTED DRAWING: Figure 1 【課題】プラズマＣＶＤ装置において、電極と支持部材との接触不良を抑制可能な技術を提供する。【解決手段】プラズマＣＶＤ装置は、水平方向に延び、一端と他端とを有し、ワークを把持するための把持部が一端と他端との間に備えられた長尺状の電極と、電極の把持部よりも一端側を、少なくとも下方から支持する第１支持部材と、電極の把持部よりも他端側を、少なくとも下方から支持する導電性の第２支持部材と、を備え、電極は、第２支持部材よりも他端側に、重り部を備える。【選択図】図１