PLASMA LIGHT SOURCE

• Main Authors: HORIOKA KAZUHIKO, SODEKODA TATSUYA, KUWABARA HAJIME, KAWASAKI TOMOAKI
• Format: Patent
• Language: English; Japanese
• Published: 22.02.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; X-RAY TECHNIQUE

PROBLEM TO BE SOLVED: To decrease a difference in the approach time of initial plasma moving from both sides in an axial direction to collide, and to increase an emission amount of extreme ultraviolet light.SOLUTION: A plasma light source 1 includes a pair of coaxial electrodes 10 opposing to each o...