METHOD FOR MANUFACTURING SUBSTRATE, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD FOR MANUFACTURING MASK BLANK, AND METHOD FOR MANUFACTURING TRANSFER MASK

• Main Author: ORIHARA TOSHIHIKO
• Format: Patent
• Language: English; Japanese
• Published: 05.10.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To provide a method for manufacturing substrates capable of manufacturing highly smooth substrates with low defects, a method for manufacturing substrates with a multilayer reflection film, a method for manufacturing mask blanks, and method for manufacturing transfer masks.SOLUTION: A process reference face of a catalytic substance and a main surface of a substrate formed of a material containing an oxide are brought in contact or close to each other, and the main surface and the process reference face are relatively moved with a processing fluid made of a liquid containing a conductive aqueous solution interposed therebetween so as to perform catalyst referred etching on the main surface.SELECTED DRAWING: Figure 1 【課題】低欠陥で高平滑な基板を製造することのできる基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、及び、転写用マスクの製造方法を提供する。【解決手段】酸化物を含む材料からなる基板に対して、導電性水溶液を含む液体からなる処理流体を介在させた状態で、触媒物質の加工基準面と前記主表面を接触又は接近させ、前記主表面と前記加工基準面とを相対運動させることにより前記主表面を触媒基準エッチングする。【選択図】図１