RESIN FOR COSMETIC AND COSMETIC

PROBLEM TO BE SOLVED: To provide a resin for a cosmetic which is excellent in temperature responsiveness and pH responsiveness suitable for cleaning and is forming a film excellent in touch feeling.SOLUTION: The resin for the cosmetic according to the present invention exhibits the lower critical so...

Full description

Saved in:
Bibliographic Details
Main Authors ABE MINEHIRO, MATSUMURA MASATO
Format Patent
LanguageEnglish
Japanese
Published 31.08.2017
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PROBLEM TO BE SOLVED: To provide a resin for a cosmetic which is excellent in temperature responsiveness and pH responsiveness suitable for cleaning and is forming a film excellent in touch feeling.SOLUTION: The resin for the cosmetic according to the present invention exhibits the lower critical solution temperature type temperature responsiveness in water, and is capable of forming a film exhibiting pH responsiveness by having a carboxyl group. In the resin for the cosmetic according to the present invention, it is preferable that the lower critical solution temperature in the 1 mass% aqueous solution of the resin for the cosmetic is within the range of 0°C to 40°C. The resin for the cosmetic according to the present invention preferably has a pH in the range of 3 to 5 in the 1 mass% aqueous solution of the resin for the cosmetic.SELECTED DRAWING: None 【課題】洗浄に適した温度応答性及びpH応答性に優れ、感触に優れた皮膜を形成する化粧料用樹脂を提供する。【解決手段】本発明に係る化粧料用樹脂は、水中で下限臨界溶液温度型温度応答性を示し、カルボキシル基を有することによりpH応答性を示す皮膜を形成することが可能である。本発明に係る化粧料用樹脂は、前記化粧料用樹脂の1質量%水溶液における下限臨界溶液温度が0℃以上40℃以下の範囲内であることが好ましい。本発明に係る化粧料用樹脂は、前記化粧料用樹脂の1質量%水溶液におけるpHが3以上5以下の範囲内であることが好ましい。【選択図】なし
Bibliography:Application Number: JP20160030810