COATING COMPOSITION FOR USE WITH OVERCOATED PHOTORESIST

• Main Authors: LEE HYE-WON, PARK JIN HONG, CHO EUNHYE, LIM JAE-BONG, RYU EUI-HYUN, SIM JAE HWAN, JO JUNG KYU
• Format: Patent
• Language: English; Japanese
• Published: 15.06.2017
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; USE OF MATERIALS THEREFOR; WOODSTAINS

PROBLEM TO BE SOLVED: To provide a coating composition excellent in an antireflection function, and a pattern forming method using the composition.SOLUTION: An organic coating composition is provided, specifically an antireflection coating composition for use with an overcoated photoresist is provided. The composition comprises (1) one or more glycidyl groups and 2) one or more aromatic groups each comprising two or more substituents containing hydroxy, thiol and/or amine moieties. A method for forming a pattern is provided, which comprises disposing the above composition on a photoresist underlay, exposing and developing.SELECTED DRAWING: None 【課題】反射防止機能に優れたコーティング組成物、および、それを用いたパターン形成方法を提供する。【解決手段】有機コーティング組成物、具体的には、オーバーコートされたフォトレジストと共に用いるための反射防止コーティング組成物であって、１）１つ以上のグリシジル基と、２）各々が、ヒドロキシ、チオール、及び／またはアミン部分を含む２つ以上の置換基を含む１つ以上の芳香族基と、を含む、反射防止コーティング組成物であり、それをフォトレジスト下層に設け、露光、現像し、パターン形成を行う方法である。。【選択図】なし