SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND STORAGE MEDIUM

• Main Authors: MATSUKI KATSUFUMI, NAKAZAWA TAKASHI
• Format: Patent
• Language: English; Japanese
• Published: 05.01.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To appropriately maintain the concentration of processing liquid and perform liquid processing of stable quality.SOLUTION: A substrate liquid processing apparatus according to one embodiment comprises a pooling part, a processing part, a recovery part, a replenishing part, and a control part. The pooling part pools processing liquid containing a plurality of components. The processing part processes a substrate by using processing liquid supplied from the pooling part. The recovery part recovers processing liquid from the processing part to the pooling part. The replenishing part replenishes a target component to be replenished which is selected from at least any one of a plurality of components in processing liquid to the pooling part. The control part executes a series of substrate liquid processing including the processing by the processing part. Further, the control part calculates a volatilized amount of the target component to be replenished which is volatilized from residual processing liquid in the pooling part, and replenishes the calculated volatilized amount by the replenishing part.SELECTED DRAWING: Figure 5 【課題】処理液の濃度を適正に保って品質の安定した液処理を行うこと。【解決手段】実施形態に係る基板液処理装置は、貯留部と、処理部と、回収部と、補充部と、制御部とを備える。貯留部は、複数の成分を含有する処理液を貯留する。処理部は、貯留部から供給される処理液を使用して基板を処理する。回収部は、処理部から貯留部へ処理液を回収する。補充部は、処理液中の複数の成分のうちの少なくともいずれかから選択される補充対象成分を貯留部へ補充する。制御部は、処理部による処理を含む一連の基板液処理を実行させる。また、制御部は、貯留部内に残存する処理液から揮発した補充対象成分の揮発量を算出し、算出した揮発量分を補充部より補充させる。【選択図】図５