POLYMERIZABLE COMPOSITION, PHOTOSENSITIVE COMPOSITION, AND CURED PRODUCT OF SAID PHOTOSENSITIVE COMPOSITION

• Main Authors: ISHIKAWA TATSURO, SHINOZAKI SHINYA, KUROKO MAYUMI
• Format: Patent
• Language: English; Japanese
• Published: 15.12.2016
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide: a polymerizable composition that produces a photosensitive composition capable of forming a pattern excellent in rectilinearity as well as excellent in adhesion to a substrate even at low exposure dose; a photosensitive composition containing said polymerizable comp...