POLYMERIZABLE COMPOSITION, PHOTOSENSITIVE COMPOSITION, AND CURED PRODUCT OF SAID PHOTOSENSITIVE COMPOSITION

• Main Authors: ISHIKAWA TATSURO, SHINOZAKI SHINYA, KUROKO MAYUMI
• Format: Patent
• Language: English; Japanese
• Published: 15.12.2016
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide: a polymerizable composition that produces a photosensitive composition capable of forming a pattern excellent in rectilinearity as well as excellent in adhesion to a substrate even at low exposure dose; a photosensitive composition containing said polymerizable composition; and a cured product of said photosensitive composition.SOLUTION: The polymerizable composition is obtained by modifying a so-called cardo structure-containing polymerizable compound having a predetermined structure containing a 9,9-diphenyl-fluorene skeleton using a polyfunctional (meth)acrylate having 1 or more hydroxyl groups. The polymerizable composition obtained by said method may contain a photopolymerization initiator and a coloring agent.SELECTED DRAWING: None 【課題】低露光量でも、直進性に優れ、且つ基板への密着性に優れるパターンを形成可能な感光性組成物を与える重合性組成物と、当該重合性組成物を含む感光性組成物と、当該感光性組成物の硬化物とを提供すること。【解決手段】９，９−ジフェニルフルオレン骨格を含む所定の構造を有する、所謂カルド構造を含む重合性化合物を、１以上の水酸基を有する多官能（メタ）アクリレートを用いて変性する。当該方法により得られる重合性組成物は、光重合開始剤や着色剤を含んでいてもよい。【選択図】なし